Using Pattern Curve, where is the resulting pattern located?

When using the Pattern Curve functionality in Siemens NX, the resulting pattern is created within the same sketch where the original curve was defined. This allows for efficient design and modification, as the newly patterned instances are directly associated with the original sketch geometry. Thus, any subsequent adjustments to the original sketch will automatically affect the pattern instances, ensuring that the design remains consistent and easy to manage.

In the context of a new sketch, that would not apply here since the pattern is not formed in a separate sketch context but rather extends from the existing geometry. An instance array typically refers to the overall arrangement of the instances rather than their placement in relation to the sketch itself. Orientation does not pertain to the location of the pattern but rather to the direction and alignment of the pattern instances. Therefore, the correct understanding is that the pattern remains in the same sketch, allowing for a cohesive and interconnected design process.