When creating a pattern using Pattern Curve, what is the approach to create a pattern effect?

Using an existing sketch to create a pattern through the Pattern Curve function is an effective approach because it allows the designer to leverage already defined geometry that can be repeated or distributed in a systematic manner. An existing sketch contains the curves and outlines necessary for the pattern, saving time and ensuring consistency, as it allows for the precise control of the pattern's elements based on previously established design intents.

This method is particularly beneficial when the sketch includes features that have already been dimensioned or constrained, promoting a more streamlined workflow where adjustments can be made to the sketch and automatically reflected in the pattern. Overall, this approach enhances efficiency and aids in maintaining design integrity, crucial in CAD applications like Siemens NX.